AI-SEMI · CORE SYSTEM
90×+Runtime acceleration
High-speed, high-precision mask correction for advanced semiconductor manufacturing.
CLOSED-LOOP WORKFLOW
From signal to decision—and back to the line.
Design layout
Read layout geometry and process constraints.
AI inference
Infer optimized patterns with the AI model.
Mask correction
Refine mask shapes for the target process.
Wafer validation
Use wafer results to inform the next correction cycle.
NEXT · AI-DRIVEN FAB